Catalog

Aurion Anlagentechnik GmbH

Aurion Anlagentechnik GmbH

  • DIN EN ISO 9001:2015

Aurion Anlagentechnik GmbH

  • DIN EN ISO 9001:2015

About Aurion Anlagentechnik GmbH

With its many years of experience and expertise from the large number of its projects, the numerous innovations and its active and deep involvement in the research landscape, AURION Anlagentechnik GmbH has been an innovation driver and part of the success story of plasma technology for more than 20 years.

Since the beginning of its industrial application in the 1970s, plasma technology has undergone an extremely dynamic development and has become increasingly important. Today it is indispensable in almost all fields of surface treatment technology and is becoming the technically and economically optimal solution in more and more industries.
 
Every plasma application pursues specific goals and has special requirements and basic conditions. AURION's goal is to rethink the best way, starting from the specific challenge and ending with an individual solution. This results in the application innovation of the variable, flexible and modular AURION system concepts and components.

The typical AURION project cycle results in a customer-specific system or component that is closely coordinated with the customer in every phase of its development, always looking for the best specific solution and thus always thinking - and going - a new way.

Vacuum Equipment

Plasma is used to manage a lot of tasks in surface treatment, i.e. coating, activation of polymers, etching of micro electronic components and cleaning. For the cleaning of surfaces different plasma g...

High Frequency Generators

Automatic impedance matching networks (PRODIK-Series) for power range 300 W to 30 kW, Switches for up to 60 kW, modular matrixes, Power-Split for simultaneous operation from one supply, Transmission a...

Physical Vapor Deposition Coating Systems (PVD)

Sputtering generally means to eject atoms from a solid state target by „bombarding“ it with accelerated gas ions. This technique is often used for the deposition of thin films. There is DC sputtering...

PECVD Systems (Plasma Enhanced Chemical Vapor Deposition)

Plasma is used to manage a lot of tasks in surface treatment, i.e. coating, activation of polymers, etching of micro electronic components and cleaning. For the cleaning of surfaces different plasma g...

Atmospheric Plasma Source

In cooperation with the Ferdinand-Braun-Institut für Höchstfrequenztechnik, Berlin, these new, very compact and cost efficient plasma sources have been developed.

The models of the AURION I...

Impedance matching network (PRODIK-Serie)

High frequency matching networks

Application
The high frequency matching networks of the PRODIK series are used for fully automatic matching of a plasma impedance to the output impedan...

RF systems for particle accelerators (ACCELOS)

Applications

  • Beam manipulation in particle acceleratos (e.g. bunch compression) 
Key Features
  • Tetrode based RF amp...

AURION Anlagentechnik GmbH offers complete system solutions for the treatment and coating of surface...

27.09.2024 16:05

RIE (Reactive Ion Etching)