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LOT-QuantumDesign GmbH

LOT-QuantumDesign GmbH

  • DIN EN ISO 9001

LOT-QuantumDesign GmbH

  • DIN EN ISO 9001

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Thin Film Stress Measurement Systems by LOT-QuantumDesign GmbH

Many commercially available systems can perform 2-dimensional stress measurements of thin films deposited on a substrate. The FLX system from Toho International is able to measure film stress in a temperature range from -65 °C up to +500 °C. By determining the change of the wafer bow before and after the film deposition, the system calculates the film stress with Stoney’s equation and graphically displays the stress distribution.

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