Quantum Design GmbH

Manufacturer
Germany
Website
Product inquiry
Phone

DIN EN ISO 9001

Quantum Design GmbH

Manufacturer
Germany
Website
Product inquiry
Phone

DIN EN ISO 9001

Thin Film Stress Measurement Systems by Quantum Design GmbH

Many commercially available systems can perform 2-dimensional stress measurements of thin films deposited on a substrate. The FLX system from Toho International is able to measure film stress in a temperature range from -65 °C up to +500 °C. By determining the change of the wafer bow before and after the film deposition, the system calculates the film stress with Stoney’s equation and graphically displays the stress distribution.

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