Sputtering targets Manufacturers online

Sputtering targets are used in thin-film technology to apply materials to surfaces.

They are the starting material in the sputtering process, a vacuum process in which material is removed from a target and deposited as a thin layer on a substrate (such as glass, semiconductors, metals).

Below is an overview of the different materials used for sputtering targets, their areas of application and their advantages and disadvantages.

Materials:

• Metals: Such as aluminum, copper, gold, titanium for electrical or optical applications.
• Alloys: Such as nickel-chromium or stainless steel for special properties.
• Ceramics: Such as aluminum oxide or zinc oxide for optical or protective coatings.

Areas of application:

1. Semiconductor industry:
Production of microchips, circuits and electronic components.

2. Optical coatings:
Production of anti-reflective coatings, mirrors and optical filters.

3. Surface finishing:
Coating of tools, watches, jewelry and medical devices.

4. Solar technology:
Production of thin-film solar cells.

Advantages:

• High precision: Enables precise control of layer thickness and material composition.
• Uniform coating: Ideal for uniform and homogeneous layers on large surfaces.
• Wide range of materials: Almost any solid material can be used as a target.

Disadvantages:

• Cost: High quality targets can be expensive, especially for rare or exotic materials.
• Wear and tear: Targets need to be replaced regularly as they wear out during sputtering.

Sputtering targets are essential in many high-tech industries and enable precise material coatings on a wide variety of substrates. The choice of material depends on the desired functionality of the coating.

Here is an overview of the most important points to consider when purchasing sputtering targets:

When purchasing sputtering targets commercially, there are several factors to consider to ensure that the target meets the specific requirements of the coating process.

• Choose the right material for your application (metal, alloy, ceramic). The properties of the sputtering material influence the coating properties (conductivity, optical properties, hardness).
• The higher the purity of the target, the better the quality of the deposited layer. Ultra-pure targets (up to 99.9999 %) are required in the semiconductor industry.
• The target should have a uniform material composition to ensure consistent layer quality.
• For complex applications, e.g. in electronics or sensor technology, alloy targets (e.g. nickel-chromium) are common.
• The size of the target must match the sputtering system and be suitable for the size of the substrate. Larger targets are ideal for larger coating areas or high production volumes.
• Sufficient target thickness is important to ensure a long service life. Targets that are too thin wear out quickly and increase costs due to more frequent changes.
• The target must be mechanically and electrically compatible with the sputtering system. Observe the specific requirements of your system (e.g. magnetron, DC or high-frequency sputtering).
• Check whether the target can be mounted correctly on the system and cooled efficiently to avoid overheating.
• Consider the price in relation to purity, size and material. High purity and rare materials are more expensive.
• You should factor in delivery times, especially for rare or customized targets.
• High-quality targets last longer and need to be replaced less often, which reduces operating costs.
• Choose a target that offers a high deposition rate to make the coating process efficient.

When purchasing sputtering targets, material selection, purity, compatibility and cost are critical. The right choice guarantees high coating quality and process stability, especially in demanding high-tech applications.

Sputtering targets can be purchased from various suppliers. Comprehensive information about manufacturers and suppliers of Sputtering targets from all over the world can be found on Exportpages.